| US 7,612,868 B2 | ||
| Exposure apparatus and method of manufacturing device | ||
| Go Tsuchiya, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Jun. 24, 2008, as Appl. No. 12/144,980. | ||
| Claims priority of application No. 2007-171223 (JP), filed on Jun. 28, 2007. | ||
| Prior Publication US 2009/0002666 A1, Jan. 01, 2009 | ||
| Int. Cl. G03B 27/72 (2006.01); G03B 27/42 (2006.01) | ||
| U.S. Cl. 355—69 [355/53] | 8 Claims |
| 1. An exposure apparatus for exposing a substrate to pulsed light supplied from a light source, the apparatus comprising:
an input device; and
a controller configured to periodically change a wavelength of the pulsed light emitted by the light source,
wherein the controller is configured to calculate number of pulsed light required to expose each point on the substrate based
on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated
number.
|