| US 7,611,810 B2 | ||
| Charged beam processing apparatus | ||
| Masahiko Okunuki, Tokyo (Japan); Haruhito Ono, Minamiashigara (Japan); Shinan Wang, Kashiwa (Japan); and Kenji Tamamori, Ebina (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Feb. 23, 2007, as Appl. No. 11/678,244. | ||
| Claims priority of application No. 2006-052005 (JP), filed on Feb. 28, 2006. | ||
| Prior Publication US 2008/0067437 A1, Mar. 20, 2008 | ||
| Int. Cl. G03F 9/00 (2006.01) | ||
| U.S. Cl. 430—30 [430/22] | 7 Claims |
| 1. A charged beam processing apparatus for processing an object to form structures on the object, the apparatus including
a processing chamber, a multi-charged beam optical system configured to generate a plurality of charged beams, and to converge
and to deflect the plurality of charged beams to irradiate the object in the processing chamber with the plurality of charged
beams, and a supply port configured to supply a gas into the processing chamber,
the multi-charged beam optical system comprising:
(i) a lens array; and
(ii) a pattern forming plate configured to select a portion of the lens array to be used to form the structures; and
the charged beam processing apparatus comprising:
a controller configured to control an exchange of the pattern forming plate in accordance with an arrangement pattern of the
structures to be formed on the object.
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