| US 7,597,940 B2 | ||
| Methods for preparing titania coatings by plasma CVD at atmospheric pressure | ||
| David William Sheel, Aughton (United Kingdom); and Martyn Pemble, Ballinspittle (Ireland) | ||
| Assigned to Saint-Gobain Glass France, Courbevoie (France) | ||
| Appl. No. 10/522,185 PCT Filed Jul. 30, 2003, PCT No. PCT/EP03/09314 § 371(c)(1), (2), (4) Date Aug. 26, 2005, PCT Pub. No. WO2004/013376, PCT Pub. Date Feb. 12, 2004. |
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| Claims priority of application No. 0217553.7 (GB), filed on Jul. 30, 2002. | ||
| Prior Publication US 2006/0141290 A1, Jun. 29, 2006 | ||
| Int. Cl. H05H 1/24 (2006.01) | ||
| U.S. Cl. 427—570 [427/573; 427/576; 427/255.36] | 20 Claims |
| 1. A method for depositing a thin film on a substrate, the method comprising:
heating the substrate at a temperature below 250° C.;
introducing a pre-vaporized reactive titania CVD precursor into a gas flow flowing through a coating region;
applying energy to generate an atmospheric pressure glow discharge plasma in the coating region and using the atmospheric
pressure glow discharge plasma as a major source of reaction to deposit the thin film on the substrate heated at the temperature
below 250° C.; and
performing a post treatment on the thin film using an atmospheric glow discharge plasma to modify properties and structure
of the thin film;
wherein a water vapor level is controlled to be from 0.05% to 1%.
|