| US 7,584,942 B2 | ||
| Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers | ||
| Dan Gealy, Kuna, Id. (US); and Ronald A. Weimer, Boise, Id. (US) | ||
| Assigned to Micron Technology, Inc., Boise, Id. (US) | ||
| Filed on Mar. 31, 2004, as Appl. No. 10/814,573. | ||
| Prior Publication US 2005/0217575 A1, Oct. 06, 2005 | ||
| Int. Cl. B01F 3/04 (2006.01) | ||
| U.S. Cl. 261—77 [261/78.2; 261/111; 261/116; 261/DIG. 65] | 17 Claims |
| 1. An ampoule for producing a reaction gas for processing a microfeature workpiece in a reaction chamber, the ampoule comprising:
a vessel including an interior volume having a precursor region configured to receive a precursor and a headspace above the
precursor region;
a conduit in the vessel, the conduit having a first portion in the precursor region, a second portion in the headspace, an
opening in the first portion positioned to be in the precursor, and an outlet in the second portion positioned to be in the
headspace;
a flow driver for flowing precursor through the conduit and into the headspace; and
a precursor exposure assembly at least partially within the headspace, the precursor exposure assembly including a plurality
of trays configured in a stack and positioned so that at least some nonvaporized precursor flows from the conduit into at
least one of the trays to increase the surface area of the precursor exposed to a carrier gas.
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