US 7,576,046 B2
	Cleaning liquid for lithography and method of cleaning therewith
Jun Koshiyama, Kawasaki (Japan); Yasumitsu Taira, Kawasaki (Japan); and Chima Shinohara, Kawasaki (Japan)
Assigned to Tokyo Ohka Kogyo Co., Ltd., Kanagawa (Japan)
Appl. No. 11/791,836 PCT Filed Dec. 26, 2005, PCT No. PCT/JP2005/023707 § 371(c)(1), (2), (4) Date May 30, 2007, PCT Pub. No. WO2006/070709, PCT Pub. Date Jul. 06, 2006.
Claims priority of application No. 2004-382130 (JP), filed on Dec. 28, 2004.
Prior Publication US 2008/0227678 A1, Sep. 18, 2008
Int. Cl. C11D 7/26 (2006.01); B08B 3/08 (2006.01)

U.S. Cl. 510—171  [510/175; 510/176; 510/177; 134/1.3]

2 Claims

1. A cleaning solution for lithography consisting of: (A) butyl acetate and (B) cyclohexanone, in a mass proportion of (A):(B) in the range from 4:6 to 7:3.