| US 7,573,030 B2 | ||
| Specimen observation method | ||
| Eiko Nakazawa, Mito (Japan); Masahiro Tomita, Hitachinaka (Japan); and Hiroyuki Kobayashi, Mito (Japan) | ||
| Assigned to Hitachi High-Technologies Corporation, Tokyo (Japan) | ||
| Filed on Mar. 13, 2007, as Appl. No. 11/717,155. | ||
| Claims priority of application No. 2006-068472 (JP), filed on Mar. 14, 2006. | ||
| Prior Publication US 2008/0073527 A1, Mar. 27, 2008 | ||
| Int. Cl. G21K 7/00 (2006.01) | ||
| U.S. Cl. 250—307 [250/306; 250/310; 250/311; 250/397; 250/400] | 3 Claims |
| 1. A specimen observation method whereby locations on a specimen displayed on an optical microscope image acquired by an optical
microscope are observed by a charged-particle beam device, said specimen observation method, comprising the steps of:
staining said optical microscope image for being acquired by said optical microscope,
acquiring said optical microscope image by said optical microscope,
acquiring an elemental mapping image based on detection of X-rays, said X-rays being emitted from said specimen when said
specimen is scanned with said charged-particle beam,
making a comparison between said optical microscope image stained and said elemental mapping image, and
scanning locations on said specimen or a location on said specimen with said charged-particle beam, coincidence degrees between
said optical microscope image stained and said elemental mapping image exceeding a predetermined value at said locations on
said specimen, said coincidence degree being the highest at said location on said specimen, and
detecting said charged particles, and/or detecting position information on said locations or said location.
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