| US 7,565,254 B2 | ||
| Method and apparatus for metrology sampling using combination sampling rules | ||
| Richard P. Good, Austin, Tex. (US); and James Broc Stirton, Austin, Tex. (US) | ||
| Assigned to Advanced Micro Devices, Inc., Austin, Tex. (US) | ||
| Filed on Dec. 13, 2006, as Appl. No. 11/609,959. | ||
| Prior Publication US 2008/0147343 A1, Jun. 19, 2008 | ||
| Int. Cl. G01N 37/00 (2006.01) | ||
| U.S. Cl. 702—83 | 26 Claims |
| 1. A method, comprising:
defining for a processor a plurality of simple sampling rules for selecting material for metrology, each simple sampling rule
having an associated penalty incurred in response to a non-selection of material meeting the rule;
defining for the processor at least one combination sampling rule relating a subset of at least two simple sampling rules,
the combination sampling rule having an associated penalty based on whether or not the material was selected for metrology
according to each simple sampling rule in the subset;
assessing using the processor, for a given material selection, the penalties responsive to the simple sampling rules and the
combination sampling rule;
selecting using the processor material for subsequent metrology based on the sampling rules and the assessed penalties; and
measuring at least one characteristic of the selected material in at least one metrology tool.
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