| US 7,565,032 B2 | ||
| Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection | ||
| Junji Oaki, Kanagawa (Japan); and Shinji Sugihara, Tokyo (Japan) | ||
| Assigned to Advanced Mask Inspection Technology, Inc., Kawasaki (Japan) | ||
| Filed on Feb. 24, 2006, as Appl. No. 11/360,679. | ||
| Claims priority of application No. 2005-276586 (JP), filed on Sep. 22, 2005. | ||
| Prior Publication US 2007/0064995 A1, Mar. 22, 2007 | ||
| Int. Cl. G06K 9/32 (2006.01) | ||
| U.S. Cl. 382—300 [382/144] | 9 Claims |
| 1. A device for correcting a pattern image by use of an inspection reference pattern image of a workpiece being tested and
a pattern image under test, said device comprising:
an equation generation unit operative to generate by linear predictive modeling a set of simultaneous equations for the reference
pattern image and the under-test pattern image;
a parameter generation unit operative to solve the equations to thereby obtain model parameters;
a parameter sum calculation unit operative to obtain a total sum of model parameters;
a sub-pixel interpolation computing unit operative to perform interpolation against the reference pattern image and the test
pattern image to thereby generate a sub-pixel interpolated image;
a sub-pixel shift amount generation unit operative to use the sub-pixel interpolated image to obtain a sub-pixel shift amount
for minimization of a deviation error in position between the reference pattern image and the test pattern image;
an error comparison unit operative to compare the parameter sum and a threshold;
a corrected pattern image generation unit operative to use the model parameter to generate a corrected pattern image based
on the linear predictive modeling; and
an interpolated image correction unit operative to generate an interpolated corrected image based on interpolation processing.
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