US 7,548,139 B2
Coupled resonator filter and fabrication method thereof
Hao-seok Park, Yongin-si (Korea, Republic of); Joo-ho Lee, Seoul (Korea, Republic of); Byeoung-ju Ha, Seongnam-si (Korea, Republic of); Seog-woo Hong, Yongin-si (Korea, Republic of); Hyung Choi, Seongnam-si (Korea, Republic of); and In-sang Song, Seoul (Korea, Republic of)
Assigned to Samsung Electronics Co., Ltd., Suwon-si (Korea, Republic of)
Filed on Jun. 19, 2006, as Appl. No. 11/455,190.
Claims priority of application No. 10-2005-0125525 (KR), filed on Dec. 19, 2005.
Prior Publication US 2007/0139139 A1, Jun. 21, 2007
Int. Cl. H03H 9/17 (2006.01); H03H 9/00 (2006.01)
U.S. Cl. 333—187  [333/189] 16 Claims
OG exemplary drawing
 
1. A method of fabricating a coupled resonator filter, comprising:
sequentially stacking a first electrode, a first piezoelectric layer, a second electrode, an insulating layer, a third electrode, a second piezoelectric layer, and a fourth electrode on a surface of a substrate;
sequentially patterning the fourth electrode, the second piezoelectric layer, the third electrode, the insulating layer, the second electrode, the first piezoelectric layer, and the first electrode to expose first predetermined areas of the first, second, and third electrodes;
forming a plurality of connection electrodes respectively connected to the first predetermined areas of the first, second, and third electrodes and a second predetermined area of the fourth electrode; and
etching a third predetermined area of the substrate underneath the first electrode to form an air gap.