US 7,547,672 B2
Composition for cleaning and degreasing, system for using the composition, and methods of forming and using the composition
Nael N. Zaki, Peoria, Ariz. (US)
Assigned to Pantheon Chemical, Inc., Phoenix, Ariz. (US)
Filed on Oct. 12, 2005, as Appl. No. 11/248,782.
Claims priority of provisional application 60/617930, filed on Oct. 12, 2004.
Prior Publication US 2006/0079423 A1, Apr. 13, 2006
Int. Cl. C11D 3/20 (2006.01); C11D 3/22 (2006.01); C11D 7/50 (2006.01)
U.S. Cl. 510—366  [510/413; 510/421; 510/461; 510/505; 510/506; 510/245; 510/365] 12 Claims
 
1. A composition for cleaning and recycling comprising:
about 0 to about 50 weight percent diluent;
about 1 to 50 weight percent surfactant;
about 0.5 to about 20 weight percent co-solvent, wherein the co-solvent is selected from a group consisting of propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, dipropylene glycol n-propyl ether, tripropylene glycol n-propvl ether, dipropylene glycol n-butyl ether, propylene glycol n-butyl ether, tripropylene glycol n-butyl ether, dipropylene glycol dimethyl ether, fatty acid methyl esters, and fatty acid amides; and
about 10 to about 99.5 weight percent 2-ethylhexyl ester, wherein the 2-ethylhexyl ester is selected from the group consisting of 2-ethylhexylcinnamate, of 2-ethylhexylsalicylate, 2-ethyihexyladipate, 2-ethylhexylstearate, and 2-ethyihexylsuccinate.