| US 7,547,619 B2 | ||
| Method of introducing impurity, device and element | ||
| Yuichiro Sasaki, Machida (Japan); Bunji Mizuno, Ikoma (Japan); and Ichiro Nakayama, Kadoma (Japan) | ||
| Assigned to Panasonic Corporation, Osaka (Japan) | ||
| Appl. No. 10/526,999 PCT Filed Sep. 19, 2003, PCT No. PCT/JP03/12001 § 371(c)(1), (2), (4) Date Mar. 07, 2005, PCT Pub. No. WO2004/027847, PCT Pub. Date Apr. 01, 2004. |
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| Claims priority of application No. 2002-274554 (JP), filed on Sep. 20, 2002. | ||
| Prior Publication US 2006/0088989 A1, Apr. 27, 2006 | ||
| Int. Cl. H01L 21/42 (2006.01); H01L 21/26 (2006.01) | ||
| U.S. Cl. 438—535 [257/E21.135; 257/E21.143] | 12 Claims |
| 1. A method of introducing impurity; wherein, in the course of introducing a material to a solid substance which has an oxidized
film or other film sticking on the surface,
the oxidized film and other film are first removed as the surface treatment to the solid substance with a means for dipping
the surface or the solid substance in a reductive liquid,
a certain desired particle is attached or introduced;
wherein the reductive liquid is at least one liquid selected from the group consisting of sulfinic acid and adipic acid di-2-ethylhexyl
ester.
|