	US 7,527,995 B2
	Method of making prestructure for MEMS systems
Jeffrey B. Sampsell, San Jose, Calif. (US)
Assigned to QUALCOMM MEMS Technologies, Inc., San Diego, Calif. (US)
Filed on May 20, 2005, as Appl. No. 11/134,490.
Claims priority of provisional application 60/613411, filed on Sep. 27, 2004.
Prior Publication US 2006/0079048 A1, Apr. 13, 2006
Int. Cl. H01L 21/00 (2006.01)

U.S. Cl. 438—48 [438/142; 438/200; 257/E21.009]

18 Claims

1. A method of forming an interferometric display element, comprising:

providing a substrate;

depositing a layer of support post material over the substrate;

patterning the layer of support post material to form at least two support posts;

depositing an electrode layer over the substrate, wherein the depositing of the electrode layer is performed after the forming of the at least two support posts, and wherein at least a first portion of the electrode layer is located between the at least two support posts;

forming at least a first sacrificial layer over at least the first portion of the electrode layer;

forming a mechanical layer over the sacrificial layer, wherein the mechanical layer covers a portion of each of the at least two support posts; and

removing at least a portion of the first sacrificial layer after formation of the mechanical layer, wherein removal of at least a portion of the first sacrificial layer allows a portion of the mechanical layer extending between the at least two support posts to be displaced with respect to the first portion of the electrode layer.