| US 7,518,708 B2 | ||
| Liquid-immersion exposure method and liquid-immersion exposure apparatus | ||
| Keiji Emoto, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Oct. 26, 2007, as Appl. No. 11/925,579. | ||
| Claims priority of application No. 2006-305242 (JP), filed on Nov. 10, 2006. | ||
| Prior Publication US 2008/0111979 A1, May 15, 2008 | ||
| Int. Cl. G03B 27/58 (2006.01); G03B 27/54 (2006.01) | ||
| U.S. Cl. 355—72 [355/67; 378/34] | 23 Claims |
| 1. A liquid-immersion exposure method, comprising:
determining a movement path of a stage, on the basis of a liquid-repellency distribution at a substrate, which a liquid contacts,
and at a surface of a member, provided around an outer periphery of the substrate,
wherein determining the movement path includes forming a first possible path and a second possible path, and selecting either
the first possible path or the second possible path, depending on whichever has a shorter movement time; and
moving the stage in accordance with the movement path.
|