| US 7,518,683 B2 | ||
| Liquid crystal display device, fabrication method thereof, and hard mask | ||
| Iichiro Inoue, Nara (Japan); Shinichi Terashita, Kyoto (Japan); Hiroyuki Hakoi, Nara (Japan); Koichi Miyachi, Kyoto (Japan); Akihito Jinda, Nara (Japan); and Takako Koide, Nara (Japan) | ||
| Assigned to Sharp Kabushiki Kaisha, Osaka (Japan) | ||
| Filed on Nov. 17, 2004, as Appl. No. 10/989,743. | ||
| Claims priority of application No. 2003-387264 (JP), filed on Nov. 17, 2003; application No. 2004-108141 (JP), filed on Mar. 31, 2004; and application No. 2004-329825 (JP), filed on Nov. 12, 2004. | ||
| Prior Publication US 2005/0146662 A1, Jul. 07, 2005 | ||
| Int. Cl. G02F 1/1337 (2006.01) | ||
| U.S. Cl. 349—129 [349/123; 349/124; 349/125; 349/126; 349/127; 349/128; 349/130; 349/187] | 42 Claims |
| 1. A fabrication method of a liquid crystal display device which displays with an alignment change in a liquid crystal layer
between a pair of substrates, comprising:
forming an alignment film on at least one of the pair of the substrates;
performing a mask rubbing process by locating a hard mask, having an opening portion, such that at least part of the hard
mask contacts the alignment film, and performing the mask rubbing process on the alignment film through the opening portion;
and
wherein the hard mask includes shock-absorbing sections on a side of the hard mask facing the alignment film.
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