| US 7,518,294 B2 | ||
| Manufacturing method of quartz crystal resonator, apparatus therefor, and quartz crystal resonator manufactured thereby | ||
| Kazushige Umetsu, Chino (Japan) | ||
| Assigned to Seiko Epson Corporation, (Japan) | ||
| Filed on May 11, 2005, as Appl. No. 11/126,983. | ||
| Claims priority of application No. 2004-151475 (JP), filed on May 21, 2004; and application No. 2005-000411 (JP), filed on Jan. 05, 2005. | ||
| Prior Publication US 2005/0258146 A1, Nov. 24, 2005 | ||
| Int. Cl. H01L 41/08 (2006.01); H01L 41/22 (2006.01); H04R 17/00 (2006.01) | ||
| U.S. Cl. 310—361 [29/25.35] | 11 Claims |

| 1. A method for manufacturing a quartz crystal resonator, the method comprising:
altering a height of a crystal chip step by step by applying a laser beam that is absorbed into a quartz crystal to the crystal
chip, the laser beam being applied step by step from an inboard portion of the crystal chip to an outboard end of the crystal
chip.
|